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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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( a ) FTIR spectra of the starting <t>graphene</t> oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.
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Image Search Results


( a ) FTIR spectra of the starting graphene oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.

Journal: Micromachines

Article Title: On-Chip Asymmetric Microsupercapacitors Combining Reduced Graphene Oxide and Manganese Oxide for High Energy-Power Tradeoff

doi: 10.3390/mi9080399

Figure Lengend Snippet: ( a ) FTIR spectra of the starting graphene oxide powders and the EPD reduced graphene oxide films; ( b ) FTIR spectrum and ( c ) the X-ray diffraction (XRD) pattern of the electrochemically deposited MnO x films.

Article Snippet: For the rGO deposition for the symmetric rGO//rGO microsupercapacitor, a suspension containing single layer graphene oxide (SLGO, Cheap Tubes Inc., Cambridgeport, VT, USA) and C 2 H 5 OH:DI water (90:10, v:v) in a concentration of 1 mg·mL −1 was used for the EPD process after 1 h ultrasonication.

Techniques:

Comparison of the asymmetric  rGO//MnO  x MSC with on-chip MSCs reported in the literature.

Journal: Micromachines

Article Title: On-Chip Asymmetric Microsupercapacitors Combining Reduced Graphene Oxide and Manganese Oxide for High Energy-Power Tradeoff

doi: 10.3390/mi9080399

Figure Lengend Snippet: Comparison of the asymmetric rGO//MnO x MSC with on-chip MSCs reported in the literature.

Article Snippet: For the rGO deposition for the symmetric rGO//rGO microsupercapacitor, a suspension containing single layer graphene oxide (SLGO, Cheap Tubes Inc., Cambridgeport, VT, USA) and C 2 H 5 OH:DI water (90:10, v:v) in a concentration of 1 mg·mL −1 was used for the EPD process after 1 h ultrasonication.

Techniques: Comparison